<?xml version="1.0" encoding="utf-8" ?> <rss version="2.0" xmlns:opensearch="http://a9.com/-/spec/opensearch/1.1/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:atom="http://www.w3.org/2005/Atom"> <channel> <title> <![CDATA[JCC Rouf Library Search for 'au:&quot;Goetsch, David L.&quot;']]> </title> <!-- prettier-ignore-start --> <link> /cgi-bin/koha/opac-search.pl?q=ccl=au%3A%22Goetsch%2C%20David%20L.%22&#38;sort_by=relevance&#38;format=rss </link> <!-- prettier-ignore-end --> <atom:link rel="self" type="application/rss+xml" href="/cgi-bin/koha/opac-search.pl?q=ccl=au%3A%22Goetsch%2C%20David%20L.%22&#38;sort_by=relevance&#38;format=rss" /> <description> <![CDATA[ Search results for 'au:&quot;Goetsch, David L.&quot;' at JCC Rouf Library]]> </description> <opensearch:totalResults>2</opensearch:totalResults> <opensearch:startIndex>0</opensearch:startIndex> <opensearch:itemsPerPage>50</opensearch:itemsPerPage> <atom:link rel="search" type="application/opensearchdescription+xml" href="/cgi-bin/koha/opac-search.pl?q=ccl=au%3A%22Goetsch%2C%20David%20L.%22&#38;sort_by=relevance&#38;format=opensearchdescription" /> <opensearch:Query role="request" searchTerms="q%3Dccl%3Dau%253A%2522Goetsch%252C%2520David%2520L.%2522" startPage="" /> <item> <title> Technology and you / </title> <dc:identifier>ISBN:0827326629</dc:identifier> <!-- prettier-ignore-start --> <link>/cgi-bin/koha/opac-detail.pl?biblionumber=8559</link> <!-- prettier-ignore-end --> <description> <![CDATA[ <img src="https://images-na.ssl-images-amazon.com/images/P/0827326629.01.TZZZZZZZ.jpg" alt="" /> ]]> <![CDATA[ <p> By Goetsch, David L..<br /> Albany, N.Y. : Delmar Publishers, 1987 .<br /> xxiii, 456 p., [16] p. of plates : , Includes index. 24 cm..<br /> 0827326629 </p> ]]> <![CDATA[ <p> <a href="/cgi-bin/koha/opac-reserve.pl?biblionumber=8559">Place hold on <em>Technology and you /</em></a> </p> ]]> </description> <guid>/cgi-bin/koha/opac-detail.pl?biblionumber=8559</guid> </item> <item> <title> Technical drawing and design / </title> <dc:identifier>ISBN:0827322232</dc:identifier> <!-- prettier-ignore-start --> <link>/cgi-bin/koha/opac-detail.pl?biblionumber=9801</link> <!-- prettier-ignore-end --> <description> <![CDATA[ <img src="https://images-na.ssl-images-amazon.com/images/P/0827322232.01.TZZZZZZZ.jpg" alt="" /> ]]> <![CDATA[ <p> By Goetsch, David L..<br /> Albany, N.Y. : Delmar Publishers, 1986 .<br /> xi, 747 p. : , Includes index. 29 cm..<br /> 0827322232 </p> ]]> <![CDATA[ <p> <a href="/cgi-bin/koha/opac-reserve.pl?biblionumber=9801">Place hold on <em>Technical drawing and design /</em></a> </p> ]]> </description> <guid>/cgi-bin/koha/opac-detail.pl?biblionumber=9801</guid> </item> </channel> </rss>
